• Advanced Lithography
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San Jose Marriott and San Jose Convention Center
San Jose, California, United States
21 - 25 February 2021
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The leading global lithography event

SPIE Advanced Lithography 2021 in San Jose, California

2021 Call for Papers
Participate in the leading global lithography event. Present your work in optical lithography, metrology, or EUV. Share the latest advancements at the meeting where leaders come to solve challenges in lithography, patterning technologies, and materials for the semiconductor industry.

SPIE remains committed to advancing light-based research and meeting the needs of our constituents by providing you with an opportunity for sharing your work and connecting you with the global scientific community. Currently, SPIE Advanced Lithography is scheduled to take place as planned, and we look forward to your participation. Find our COVID-19 Policy here.

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Abstract Due Date
2 September 2020

Author Notification Date
19 October 2020

Nick Cobb Scholarship
9 October 2020

Information for authors

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Explore the 2021 conference topics

SPIE Advanced Lithography 2021 call for paper topical areas
• Extreme Ultraviolet (EUV) Lithography
• Novel Patterning Technologies
• Metrology, Inspection, and Process Control for Semiconductor Manufacturing
• Advances in Patterning Materials and Processes
• Optical Lithography
• Design-Technology Co-optimization
• Advanced Etch Technology and Process Integration for Nanopatterning

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2020 Proceedings


Did you attend in 2020? Access the papers and presenations. 

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2020 Program

View the 2020 program to see the papers, special events, and more.

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Watch the plenary presentation

2020 Plenary

Watch the open access recording of the presentation by John A. Rogers.

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Proceedings of SPIE

SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research.  

The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers. 

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